Publications

Below is a comprehensive list of my academic publications, with download links where possible.

Ph.D. Thesis

Lynn, Shane (2011) Virtual metrology for plasma etch processes. PhD thesis, National University of Ireland Maynooth.

Journal contributions

1. Lynn, Shane and MacGearailt, Niall and Ringwood, John (2012) “Real-time virtual metrology and control for plasma etch“. Journal of Process Control, 22 . pp. 666-676. ISSN 0959-1524
2. Lynn, Shane and Ringwood, John and MacGearailt, Niall (2012) “Global and Local Virtual Metrology Models for a Plasma Etch  Process“, IEEE Transactions on Semiconductor Manufacturing, 25 (1). pp. 94-103. ISSN 0894-6507
3. Ringwood, J.V., Lynn, S., Bacelli, G., Ma, B., Ragnoli, E., and McLoone, S., “Estimation and control in semiconductor etch: Practice and possibilities“, IEEE Transactions on Semiconductor Manufacturing, vol. 23, no. 1, pp. 87-98, Feb. 2010.
4. Lynn, S., Ringwood, J.V., and Del Valle Gamboa, J.I., “Temperature Estimation for a Plasma-Propelled Rocket Engine – Inferential Measurement using Optical Emission Spectrometer Data“, IEEE Control Systems Magazine, Vol. 29, No. 6, pp. 15-25, Dec. 2009.

Peer Reviewed Conference Proceedings

1. Lynn, S.A.; MacGearailt, N.; Ringwood, J.V., “Real-time virtual metrology and control of etch rate in an industrial plasma chamber,” Control Applications (CCA), 2012 IEEE International Conference on , vol., no., pp.1658,1663, 3-5 Oct. 2012.
2. Lynn, S., Ringwood, J., and MacGearailt, N., “Real-time virtual metrology and control of electron density in an industrial plasma etch chamber“, IFAC World Congress 2011, accepted for publication and presentation Aug. 2011.
3. Lynn, S., Ringwood, J., and MacGearailt, N., “Gaussian process regression for virtual metrology of plasma etch“, Irish Signals and Systems Conference, oral presentation, Cork, Ireland, Jun. 2010, pp. 42-47 (received best student paper award).
4. Lynn, S., Ringwood, J., and MacGearailt, N., “Weighted windowed PLS models for virtual metrology of an industrial plasma etch process“, 2010 IEEE International Conference Industrial Technology (ICIT), oral presentation, Vina del Mar, Chile, Mar. 2010, pp. 309-314.
5. Ragnoli, E., McLoone, S., Lynn, S., Ringwood, J.V., and MacGearailt, N., “Identifying key process characteristics and predicting etch rate from High-Dimension Datasets“, in  Proceedings of the Advanced Semiconductor Manufacturing Conference (ASMC), Berlin, Germany, May. 2009, pp. 106-111.
6. Lynn, S., Ringwood, J.V., Ragnoli, E., McLoone, S., and MacGearailt, N., “Virtual Metrology for Plasma Etch using Tool Variables“, in Proceedings of the Advanced Semiconductor Manufacturing Conference (ASMC), Berlin, Germany, May. 2009, pp. 143-148.
7. Lynn, S., Ringwood, J.V., and Del Valle Gamboa, J.I., “State Estimation for the VASIMR Plasma Engine”, in Proceeding of the 16th Irish Signals and Systems Conference, oral Presentation, Galway, Ireland, 2008, pp. 24-29.